PhD position: Understanding fast ionic and neutral particle 'debris' generation in plasma sources of EUV light

The PhD project aims at unveiling and quantifying the fundamental processes behind the generation of detrimental fast ionic and neutral particle 'debris' in current and future tin-plasma sources of extreme ultraviolet (EUV) light for nanolithography ...

14 dagen geleden

Arbeidsvoorwaarden

Standplaats:
Van Vollenhovenlaan, Utrecht, Utrecht
Dienstverband:
Tijdelijk contract / Tijdelijke opdracht
Uren per week:
40 uur
Salarisindicatie:
€ 2834 per maand
Opleidingsniveau:
WO

Functieomschrijving

The PhD project aims at unveiling and quantifying the fundamental processes behind the generation of detrimental fast ionic and neutral particle 'debris' in current and future tin-plasma sources of extreme ultraviolet (EUV) light for nanolithography. What determines the charge and energy distributions of the fast highly charged ions that are emitted from the hot and extremely dense tin plasma? What sets the size and speed of the tin microdroplets created by laser-pulse impact on the droplet target? Answering these questions, employing novel ion spectrometry and high-resolution imaging tools, will enable the control of this 'debris', paving the road for better sources. The PhD student will be embedded in the EUV Plasma Processes team at ARCNL, but will also be actively involved in experiments at external laboratories and (industrial) facilities. This project is part of an NWO-VIDI grant titled 'New light for nanolithography.

Research

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, the Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also http://www.arcnl.nl
The research activities of the EUV Plasma Processes group aim at the understanding of the basic dynamics on an atomic and molecular level of the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

Functie-eisen

You have an MSc in (applied) physics. Knowledge in the fields of laser physics, imaging, fluid dynamics, atomic and molecular physics, or vacuum technology is advantageous. Good verbal and written communication skills (in English) are required. When fulfilling a PhD position at NWO-I, you will get the status of junior scientist.

Conditions

You will have an employee status and can participate in all the employee benefits NWO-I offers. You will get a contract for four years. Your salary will be up to a maximum of 2,834 euro gross per month. The salary is supplemented with a holiday allowance of 8 percent and an end-of-year bonus of 8.33 percent. You are supposed to have a thesis finished at the end of your four year term with NWO-I. A training programme is part of the agreement. You and your supervisor will make up a plan for the additional education and supervising that you specifically need. This plan also defines which teaching activities you will be responsible (up to a maximum of ten percent of your time). The conditions of employment of NWO-I are laid down in the Collective Labour Agreement for Research Centres (Cao-Onderzoekinstellingen), more exclusive information is available at this website under Personeelsinformatie (in Dutch) or under Personnel (in English). General information about working at NWO-I can be found in the English part of this website under Personnel. The 'Job interview code'applies to this position.

Additional information

For additional information please contact Dr. Oscar Versolato , group leader Atomic Plasma Processes, +31 20 851 71

Bedrijfsomschrijving

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Foundation of Scientific Research Institutes (NWO-I), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, the Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also http://www.arcnl.nl

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