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We have an open position for a PhD student who is interested to work with Computational Imaging for advanced semiconductor metrology. The candidate will explore extensions of lens-less imaging towards computational imaging methods that aim ...
We have an open position for a PhD student who is interested to work with Computational Imaging for advanced semiconductor metrology. The candidate will explore extensions of lens-less imaging towards computational imaging methods that aim to improve optical measurement techniques for metrology of semiconductor devices. The challenges that are encountered are very diverse and range from studying basic scientific questions on “information content in scattered light”, developing/improving signal recovery algorithms and building a stable low-noise measurement set-up. This activity has a clear link to applications in semiconductor metrology and will be carried out in close collaboration with the ASML Research department and the “EUV Generation and Imaging” group at ARCNL. For more information about the PhD position please look at https://arcnl.nl/jobs/phd-student-computational-imaging-for-advanced-semiconductor-metrology.
The PhD candidate must have (or will receive in near future) a master’s degree in physics or a closely related subject. Experience with any of the involved topics (optics, lasers, imaging, image processing, inverse problems, non-linear optimization problems) is considered an advantage.
The appointment will be initially for 1 year. After satisfactory evaluation of the initial appointment, it can be extended for a total duration of 4 years. The appointment should lead to a dissertation(PhD thesis).
You can find information about our excellent fringe benefits of employment at http://www.workingatvu.nl
• Remuneration of 8,3% end-of-year bonus and 8% holiday allowance;
• A minimum of 29 holidays in case of full-time employment;
• Discounts on collective insurances (healthcare- and car insurance).
The salary will be in accordance with university regulations for academic personnel, and amounts € 2.222,- gross per month in the first year up to € 2.840,- in the fourth year (salary scale 85) based on a full-time employment.
For further information please contact Prof. Dr. Arie den Boef (email: email@example.com), or Dr. Stefan Witte (firstname.lastname@example.org).
Website: http://www.vu.nl or http://www.arcnl.nl.
Applicants are requested to write a letter in which they describe their abilities and motivation, accompanied by a curriculum vitae and one or two references (name(s) and e-mail address(es).
Please send your application before 21 October 2017
Please mention the vacancy number in the e-mail header.
Any other correspondence in response to this advertisement will not be dealt with.
Vrije Universiteit Amsterdam (VU) is a leading, innovative and growing university that is at the heart of society and actively contributes to new developments in teaching and research. Our university has ten faculties, and provides work for over 4,500 staff and scientific education for more than 23,000 students.
The Department of Physics and Astronomy consists of 25 research staff members, 4 fte teaching staff members, 6 technicians (exclusive the mechanical and electronic workshops), 75 postdocs and PhD students, and 350 students that follow Joint VU/UvA Bachelor and Master degrees in Physics, Medical Natural Sciences and Science, Business and Innovation.
The department has focused its research in five themes: Biophotonics & Medical Imaging, Physics of Living Systems, Biophysics / Physics of Energy, Atoms, Molecules & Lasers, and Astro-Particle Physics. The department works in a close collaboration with the University of Amsterdam (UvA), Advanced Research Center for Nanolithography (ARCNL), AMOLF and Nikhef.
This research project is part of ARCNL, a public-private partnership of VU, UvA, ASML and NWO. The main activities will be carried out at the VU and supervised by prof. dr. A. den Boef (“Metrology and Nanolithography”), who is associated with the group for “Ultrafast Laser Physics and Precision Metrology” at the VU. The main themes of that group are:
• Frequency comb lasers and ultrafast laser technologies from NIR to XUV wavelengths;
• Precision spectroscopy for fundamental tests;
• Coherent soft-X-ray generation by high-harmonic generation with ultrafast lasers;
• Coherent diffractive (“lens-less”) imaging from NIR to XUV wavelengths.